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Course Criteria
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2.00 Credits
College-Sponsored Experiential Learning (CSEL) is designed to integrate on-the-job learning experiences with classroom studies. These experiences are structured either to explore career options or to prepare for a specific occupation. Students participating in the Cooperative Education and Internship Program gain college credit and are graded for their learning/work experience by the appropriate faculty. Students participating in this 120 hour internship will earn 2 college credits for this experience. Upon successful completion of this hands-on work experience, the student should be able to satisfy instructionally selected competencies from those below according to the number of credits to be awarded. NOTE To be eligible for an internship, students must: Have completed a minimum of 18 or more credits within the last 5 years. Have begun course work in their major (at least 9 credits). Have an overall grade point average (GPA) of 2.5. Obtain a written recommendation by a DCCC faculty within the discipline of the internship. Submit a current resume to the Office of Student Employment Services.Upon completion of this course, students should be able to: Explain three program-related concepts that have been applied during the work experience. Describe the ways that technology is utilized in the work experience. Analyze the culture of the host organization. Analyze an operational process within the work experience. Demonstrate how assigned tasks depend on successful communication. Describe how time and activity are managed to meet work-imposed deadlines. Describe an instance where problem-solving skills were needed to analyze a situation in the work experience. Formulate a self-assessment for career growth and personal satisfaction. Satisfy the competencies of the chosen CSEL placement (to be developed in consultation with the CSEL instructor). Work closely with a faculty mentor in the student's program/major to complete a project which articulates how the experience helps the student achieve program outcomes.
Prerequisite:
To be eligible for an internship, students must: Have completed a minimum of 18 credits within the last 5 years. Have begun course work in their major (at least 9 credits). Have an overall grade point average (GPA) of 2.5. Obtain a recommendation by a
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3.00 Credits
College-Sponsored Experiential Learning (CSEL) is designed to integrate on-the-job learning experiences with classroom studies. These experiences are structured either to explore career options or to prepare for a specific occupation. Students participating in the Cooperative Education and Internship Program gain college credit and are graded for their learning/work experience by the appropriate faculty. Students participating in this 180 hour internship will earn 3 college credits for this experience. Upon successful completion of this hands-on work experience, the student should be able to satisfy instructionally selected competencies from those below according to the number of credits to be awarded. NOTE To be eligible for an internship, students must: Have completed a minimum of 18 or more credits within the last 5 years. Have begun course work in their major (at least 9 credits). Have an overall grade point average (GPA) of 2.5. Obtain a written recommendation by a DCCC faculty within the discipline of the internship. Submit a current resume to the Office of Student Employment Services.Upon completion of this course, students should be able to: Explain three program-related concepts that have been applied during the work experience. Describe the ways that technology is utilized in the work experience. Analyze the culture of the host organization. Analyze an operational process within the work experience. Demonstrate how assigned tasks depend on successful communication. Describe how time and activity are managed to meet work-imposed deadlines. Describe an instance where problem-solving skills were needed to analyze a situation in the work experience. Formulate a self-assessment for career growth and personal satisfaction. Satisfy the competencies of the chosen CSEL placement (to be developed in consultation with the CSEL instructor). Work closely with a faculty mentor in the student's program/major to complete a project which articulates how the experience helps the student achieve program outcomes.
Prerequisite:
To be eligible for an internship, students must: Have completed a minimum of 18 credits within the last 5 years. Have begun course work in their major (at least 9 credits). Have an overall grade point average (GPA) of 2.5. Obtain a recommendation by a
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3.00 Credits
This course examines the behavior of electrical and mechanical components used in interfacing the machine environment to the outside world. The course concentrates on the behavior of input and output devices used to detect, measure and control mechanical, thermal, fluid, optical and electrical processes.Upon completion of this course, students should be able to: Analyze the characteristics and behavior of various input devices and transducers. Analyze the characteristics and behavior of various output devices. Describe various methods of modifying analog output signals of devices using amplification and filtering. Describe various methods of modifying digital output signals of devices using digital techniques and devices including analog-digital/digital-analog converters. Describe various feedback techniques (from detection, modification and control) used to control various processes. Develop skills to troubleshoot input sensors, output devices and controllers. Be able to use various test equipment to localize probable faults in a control system.
Prerequisite:
Prerequisite: TEL 110.
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4.00 Credits
This course provides a perspective on the essential aspects of biomedical equipment. It covers practical matters such as operation, calibration, maintenance and troubleshooting of medical equipment. Topics covered by this course include an overview of the human body, the heart and the circulatory system. It also covers electrodes and transducers, bioelectric amplifiers, electrocardiographs, intensive care units, electro-optics, computers in biomedical equipment and electrical safety in the medical environment. Experiments are performed in conjunction with all major topics to reinforce theory.Upon completion of this course, students should be able to: Define major systems, characteristics and principle functions of the human body. Describe the characteristics and properties of electrodes, transducers and bioelectric amplifiers. Describe the fundamentals and properties of electro-cardiographs, the intensive care unit and operating rooms. Define electrical safety as applied to medical institutions. Define the characteristics and the properties of electro-optics in the biomedical field. Describe the operation and the characteristics of computers used in Biomedical Equipment.
Prerequisite:
Prerequisite: TEL 101 and TEL 110 and TEL 111*. (*Courses may be taken concurrently.)
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4.00 Credits
This course is an applied course in Electronics, which aims to provide the student with clear and concise instruction on how to repair consumer electronic equipment. Students will discuss the operation of basic electronic systems such as amplifiers, power supplies, stereo receivers and CD players. Schematic diagrams and block diagrams will be studied for call type of device. The techniques utilized in this course are universally applicable in all types of electronic equipment regardless of their application. Theory and applications acquired in pre-requisite electronic courses will be applied to Troubleshooting and Repair. Upon completion of this course, students should be able to: Demonstrate a process for finding fault in electronic circuits Demonstrate the techniques used to locate various faults in a basic guide amplifier system Demonstrate the ability to solder and desolder components in a PC board Analyze and define the operation of a basic split DC power supply Utilize the manufacturers' service manual for repair and adjustments for pioneer models SX-251R and PD-102 Demonstrate the ability to repair a stereo receiver Pioneer Model Sx-251R and a CD player Pioneer Model PD-102.
Prerequisite:
Prerequisite: TEL 110.
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3.00 Credits
This course provides an overview of basic nanofabrication processing equipment and material chemistry and handling procedures. The focus is on cleanroom protocol, safety, environmental and health issues in equipment operation and materials handling. Safety and health issues will be covered for the following topics: cleanroom operation; vacuum pump systems operation; furnace operation; chemical vapor deposition system operation; and vacuum deposition/etching system operation. Specific materials handling issues will include deionization water, solvents, cleaners, ion implantation sources, diffusion sources, photoresists, developers, metals, dielectrics, and toxic, flammable, corrosive, and high purity gases as well as packaging materials.Upon completion of this course, students should be able to: Identify the basic nanofabrication processing equipment. Describe the uses and applications of the basic nanofabrication processing equipment. Identify safety hazards associated with nanofabrication. Explain the fundamentals of vacuum technology including pumps, components, and metrology. Identify materials used in nanofabrication manufacturing. Operate material metrology equipment. Associate the material handling issues with each identified nanofabrication material. Explain basic chemical properties of materials. Summarize basic cleanroom operation and protocol. Demonstrate an understanding of basic cleanroom operation and protocol.
Prerequisite:
Prerequisite: TEL 111 and TEL 121 and TEL 210 and MAT 210 and ENG 112 and TEL 261* (*May be taken concurrently.)
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3.00 Credits
This course provides an overview of basic processing steps in Nanofabrication (contact lithography, basic etching and deposition techniques). The majority of the course details a step-by-step description of the equipment and processes needed to fabricate devices and structures. Processing flow will be examined for structures such as microelectronic devices including diode and the MOS capacitor. Students receive an in depth introduction to basic lithography from wafer preparation to final inspection. Contamination issues in nanofabrication are discussed in detail. Students will learn the similarities and differences in both equipment and process flows for each configuration by undertaking "hands-on" processing.Upon completion of this course, students should be able to: Perform basic lithography processes. Operate contact lithography equipment. Operate optical microscopes and imaging software. Operate metrology equipment. Explain electrical characterization equipment. Describe the basic steps in p-n junction diode process flow. Identify the equipment in p-n junction diode process flow. Explain the complete p-n diode manufacturing process in a class 10 cleanroom. Describe the basic steps in a MOS capacitor process flow. Identify the equipment in a MOS capacitor process flow. Compare the similarities and differences in equipment and process flow for the process flows listed above.
Prerequisite:
Prerequisite: TEL 260* (*May be taken concurrently.)
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3.00 Credits
This course covers advanced thin film deposition and etching practices in nanofabrication. Advanced deposition techniques covered in the first part of the course include atmosphere, low-pressure and plasma enhanced chemical vapor deposition, sputtering, thermal and electron beam evaporation. The study of materials includes dielectrics, polysilicon and metals. The second part of the course focuses on advanced etching practices and techniques emphasizing reactive ion etching, high-density plasma systems, ion beam etching, and wet chemical etching. Students will receive hands-on experience in depositing and etching dielectric, semiconductor, and metallic materials using state-of-the-art tools and practicing many of the steps critical to nanofabrication of semiconductor devices including microelectronics, MEMs devices, display structures, and structures used in the biotechnology fields. Upon completion of this course, students should be able to: Explain all chemical vapor deposition (CVD) processes used in nanofabrication. Explain the operation of CVD equipment. Describe the uses of different CVD thin films in nanofabrication. Explain all physical vapor deposition (PVD) processes used in nanofabrication. Set up and operate equipment to perform PVD. Describe the uses of different PVD thin films in nanofabrication. Explain the processes in wet chemical etching techniques. Set up and operate equipment to perform wet chemical etching. Describe the uses of wet chemical etching techniques. Explain the processes in plasma etching techniques used in nanofabrication. Set up and operate equipment to perform plasma etching. Describe the uses of plasma etching techniques. Operate a scanning electron microscope for materials characterization.
Prerequisite:
Prerequisite: TEL 260 and TEL 261.
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3.00 Credits
This course covers all aspects of advanced lithography from design and mask fabrication to pattern transfer and inspection. The course is divided into three major sections. The first section describes the advanced lithographic process from substrate preparation to exposure. Most of the emphasis is on understanding the nature and behavior of photoresist materials. The second section examines systems and techniques that define patterns. This section will introduce specialized optical masks and reticles, aligners, steppers and scanners. In addition, critical dimension (CD) control and profile control of photoresist will be investigated. The last section will discuss advanced optical lithographic techniques such as phase shifting masks and illumination schemes as well as e-beam, e-ray, EUV, and ion beam lithography. A section about engineering dielectrics is also discussed.Upon completion of this course, students should be able to: Explain the process steps necessary to produce a photolithographic pattern in positive, negative and chemically amplified resists. Describe the nature and behavior of photoactive materials such as BCB. Describe all lithographic techniques in nanofabrication. Explain mask layout and fabrication for photolithography. Describe and perform alignment and registration in photolithography. Identify the equipment used in photolithography. Set up and operate equipment used in photolithography. Modify profiles in photoresist for liftoff applications.
Prerequisite:
Prerequisite: TEL 260 and TEL 261.
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3.00 Credits
This course will cover in detail the processing steps used in modifying material properties in nanofabrication. An intensive study of metals used in nanotechnology aids the student in understanding the various methods of metalization such as CVD, evaporation, and sputtering. Metal applications for interconnect technologies will be examined. Aluminum, refactory metals and copper deposition techniques and characterization will be discussed in detail along with topics such as diffusion barriers, contact resistance, electromigration, corrosion, stress effects, and adhesion. Other modification technologies such as ion implementation, diffusion and surface preparation and treatment are integrated as well. An intensive study of dielectric properties and materials including dielectric constant engineering, mechanical, optical, and electrical characteristics, poly, BSG, PSG, SOG, and BPSG gives the student further insight into advanced device fabrication. Material properties and basic device structures will be discussed for the optoelectronic market.Upon completion of this course, students should be able to: Contrast thermally grown oxides with spin on dielectrics. Identify the processing equipment for slicing, etching and polishing. Describe the procedures for slicing, etching, polishing, and epitaxial growth. Perform advanced fabrication techniques. Determine the processing parameters of dielectric materials. Explain the concept of engineering dielectric constants for different nanofabrication applications. Explain metalization techniques and processing equipment. Select appropriate materials to match the design needs of nanofabricated devices. Describe the process of direct bandgap photonic emission. Examine common materials and properties for the optoelectronic market. Describe the need for optoelectronic devices.
Prerequisite:
Prerequisite: TEL 260 and TEL 261 and TEL 262 and TEL 263.
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