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Course Criteria
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4.00 Credits
This course covers the topics in modern quantum theory which are relevant to atomic physics, radiation theory and quantum optics. The theory is developed in terms of Hilbert space operators. The quantum mechanics of simple systems, including the harmonic oscillator, spin, and the one-electron atoms, are reviewed. Also, methods of calculation useful in modern quantum optics are discussed. These include manipulation of coherent states, the Block sphere representation, and conventional perturbation theory.
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4.00 Credits
The course concerns the aspects of the solid state physics of materials, which influence their optical properties. Semiconductors are emphasized, but metals and insulators are treated also. The physics of optical absorption, emission, reflection, modulation, and scattering of light is covered. Optical properties of electrons, phonons, plasmons, and polaritons are detailed. The optical properties of reduced dimensionality structures such as quantum wells are contrasted with those of bulk semiconductors.
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4.00 Credits
The mechanical design and analysis of optical components and systems will be studied. Topics will include kinematic mounting of optical elements, the analysis of adhesive bonds, and the influence of environmental effects such as gravity, temperature, and vibration on the performance of optical systems. Additional topics include analysis of adaptive optics, the design of lightweight mirrors, thermo-optic and stress-optic (stress birefringence) effects. Emphasis will be placed on integrated analysis which includes the data transfer between optical design codes and mechanical FEA codes. A term project is required for ME 432.
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4.00 Credits
This course provides an in-depth understanding of the principles and practices of optical instrumentation: Optical metrology, including wavefront and surface metrology, interferometric instruments and interferogram analysis, coherence and coherence-based instruments, phase measurement and phase-shifting interferometry; Spectroscopic instrumentation, including the Fourier Transform Spectrometer, the Fabry-Perot interferometer, and the grating monochromator; Image plane characterization (star test, Ronchi test, and modulation transfer function); The influence of illumination and partial coherence on image forming systems, including microscopes, systems for projection lithography, and displays.
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