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Course Criteria
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1.00 Credits
No course description available.
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2.00 Credits
No course description available.
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2.00 Credits
No course description available.
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1.00 Credits
This laboratory will develop a foundational skill set introducing measurements of the transverse wave nature of light. Students will also develop skills needed to gather, analyze, and communicate experimental results clearly and efficiently.
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4.00 Credits
Introduction to quantum mechanics in the context of modern optics and optical technology. Wave mechanics applied to electrons in crystals and in quantum wells. Absorption and emission in semiconductors and the optical properties of materials. Semiconductor junctions in photodetectors and photoemitters.
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4.00 Credits
The mechanical design and analysis of optical components and systems will be studied. Topics will include kinematic mounting of optical elements, the analysis of adhesive bonds, and the influence of environmental effects such as gravity, temperature, and vibration on the performance of optical systems. Additional topics include analysis of adaptive optics, the design of lightweight mirrors, thermo-optic and stress-optic (stress birefringence) effects. Emphasis will be placed on integrated analysis which includes the data transfer between optical design codes and mechanical FEA codes. A term project is required for ME 432.
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4.00 Credits
Optical instruments and their use. First-order Gaussian optics and thin-lens system layout. Photometric theory applied to optical systems. The eye, magnifier, microscope, matrix optics, nature of Seidel aberrations. Laboratory.
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4.00 Credits
This course is an introduction to the technologies and techniques of optical fabrication. Topics covered include optical material properties, grinding, polishing, CNC programming for optical fabrication, modern fabrication technologies, surface testing and fabrication tolerances. We will discuss case studies of challenging optical fabrication projects for leading-edge optical systems. The accompanying laboratory sessions will use the facilities of the Hopkins Center fabrication and metrology labs to introduce polishing and metrology techniques. Lab exercises will include hands on experiments, such as exploring the properties of optical materials, measuring the removal function of a sub-aperture polishing machine, and characterizing the surface texture of polished surfaces.
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4.00 Credits
This course will cover such topics as the effects of dispersion, scatter, and inhomogeneity in multilayer interference coating designs. Attention will be given toward manufacturability of designs and meeting common optical specifications. Design assignments will address fields including, but not limited to Ophthalmic, Lighting, Display, Infrared applications, Lasers, and Telecommunications.
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4.00 Credits
This course explores the design of the human eye, revealing the optical and neural factors that limit color and spatial vision. The design of eyes (such as those of predatory birds and the compound eyes of insects) that evolved to operate in environments different from that of the human eye will also be examined. The course will begin with a treatment of the information losses associated with the eye's optics, the photoreceptor mosaic, and the ganglion cell array that transmits visual information to the brain. The course will end with a discussion of image processing by the visual cortex of the brain.
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