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Course Criteria
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4.00 Credits
This course presents the architecture, components, operations, and security for large, complex networks, including wide area network (WAN) technologies. The course emphasizes network security concepts and introduces network virtualization and automation. Students learn how to configure, troubleshoot, and secure enterprise network devices and understand how application programming interfaces (API) and configuration management tools enable network automation.
Prerequisite:
NET 172
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4.00 Credits
This course will cover theory and principles regarding direct current (DC), alternating current (AC), digital and electronic circuits.Topics include ifferent types of DC/AC sources, waveforms, basic circuit elements, series and parallel circuits, applicable theorems and laws, digital logic circuits and number systems, logic gates, Boolean algebra,Karnaugh mapping, and solid state electronics.Thiscourse is designed for students majoring in the Nanoscience Technology Program.
Prerequisite:
CHE 150, (MAT 165, MAT 180, MAT 220, MAT 221, or MAT 222), and (PHY 150 or PHY 245)
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1.00 Credits
This is an orientation course for all students considering the Nanoscience technology emphasis in Laboratory Science and the capstone semester at the Nanofabrication Laboratory at Penn State University.The primary aim of this course is to prepare students for the rigors of this very intense training sequence. An introduction/orientation to the program educational requirements and details of career opportunities as technicians/technologists within the rapidly expanding field of nanofabrication will be covered. Associated topics will be researched.
Prerequisite:
COM 121, COM 141, IFT 110, MAT 165, and MAT 210
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3.00 Credits
This course overviews basic material properties as well as environment, health, and safety(EHS) issues in equipment operation and materials handling in "top down" and "bottom up" nanofabrication. The chemical and physical materials properties underlying nanotechnology are surveyed. EHS topics arising from the processing and disposal of these materials are addressed including: cleanroom operation, OSHA lab standard safety training, health issues, biosafety levels(BSL) guidelines, and environmental concerns. Specific safety issues dealing with nanofabrication equipment, materials, and processing will also be discussed including those pertinent to wet benches, thermal processing tools, plasma based equipment, optical, e-beam, stamping and embossing lithography tools, vacuum systems and pumps, gas delivery systems and toxic substance handling and detection.
Prerequisite:
COM 141, (MAT 165, MAT 180, MAT 220, MAT 221, or MAT 222), MAT 210, and NSC 200
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3.00 Credits
This course is an overview of the broad spectrum of processing approaches involved in "top down", "bottom up", and hybrid nanofabrication. The majority of the course details a step-by- step description of the equipment, facilities processes and process flow used in today's device and structure fabrication. Students learn to appreciate processing and manufacturing concerns including safety, process control, contamination, yield, and processing interaction. The students design process flows for micro- and nano-scale systems. Students learn the similarities and differences in "top down" and "bottom up" equipment and process flows by undertaking hands- on processing. This hands-on overview exposure covers basic nanofabrication processes including deposition, etching, and pattern transfer.
Prerequisite:
NSC 211
Corequisite:
NSC 211
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3.00 Credits
This course is an in-depth, hands-on exposure to the producing and tailoring of the materials used in nanofabrication. The course will cover chemical materials production techniques such as colloidal chemistry to attain nanoparticles; atmosphere, low-pressure and plasma enhanced chemical vapor deposition; nebulization; and atomic layer deposition. It will also cover physical techniques such as sputtering; thermal and electron beam evaporation; and spin-on approaches. Manufacturing methods for organic nanomaterials such as liposomes will be reviewed. This course is designed to give students experience in producing a wide variety of materials tailored for their mechanical, electrical, optical, magnetic, and biological properties.
Prerequisite:
NSC 211 and NSC 212
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3.00 Credits
This course is a hands-on treatment of all aspects of advanced pattern transfer and pattern transfer equipment including probe techniques; stamping and embossing; e-beam; and optical contact and stepper systems. The course is divided into five major sections. The first section is an overview of all pattern generation processes covering aspects from substrate preparation to tool operation. The second section concentrates on photolithography and examines such topics as mask template, and mold generation. Chemical makeup of resists will be discussed including polymers, solvents, sensitizers, and additives. The role of dyes and antireflective coatings will be discussed. In addition, critical dimension (CD) control and profile control of resists will be investigated. The third section will discuss the particle beam lithographic techniques such as e- beam lithography. The fourth section covers probe pattern generation and the fifth section explores imprinting lithography, step-and-flash, stamp lithography, and self- assembled lithography.
Prerequisite:
NSC 212 and NSC 213
Corequisite:
NSC 212, NSC 213
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3.00 Credits
This course covers the applications of nano-scale devices and systems and the material, chemical, physical, biological, or multiple-property requirements necessitated in these applications. These techniques are integrated by analyzing applications such as microfluidics. Material modifications to meet these requirements will be addressed including structure control, composition control, surface property control, strain control, functionalization, and doping.
Prerequisite:
NSC 211, NSC 212, NSC 213, and NSC 214
Corequisite:
NSC 211, NSC 212, NSC 213, NSC 214
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3.00 Credits
This course examines a variety of techniques and measurements essential for testing and for controlling material fabrication and final device performance. Characterization includes electrical, optical, physical, and chemical approaches. The characterization experience will include hands-on use of tools such as the Atomic Force Microscope (AFM), Scanning Electron Microscope (SEM), 1 nm resolution field emission SEM, UV-VIS spectrophotometer, and optical microscopes.
Prerequisite:
NSC 212, NSC 213, NSC 214, and NSC 215
Corequisite:
NSC 212, NSC 213, NSC 214, NSC 215
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1.00 Credits
Review of basic math skills for Registered Nursing students only. This will assist in preparation for the math test at the start of clinical. By petition only, with approval of program advisor.
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