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Course Criteria
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1.00 Credits
Corequisite: EE 430. Advanced transistor, operational amplifier, and linear-integrated circuits and systems design laboratory. Not open for credit to students with credit in EE 433L. (Laboratory 3 hours) Letter grade only (A-F).
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3.00 Credits
Prerequisites: EE 201 and EE 330, or 331, or consent of instructor. CMOS fabrication. Component layout. MOSFET modeling. Mixed-signal devices such as D/A and A/D converters and phase-locked loops. Substrate Noise coupling. System-on-chip considerations. Design using CAD tools. Additional projects required for EE 534. (Lecture-problems 2 hours, Laboratory 3 hours) Letter grade only (A-F).
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3.00 Credits
Prerequisites: EE 201, 330. Microelectronic fabrication processes and characterization of devices. Full custom design examples with small scale integration of bipolar, NMOS and CMOS devices, semiconductor memories and PLA's, both analog and digital formats. Not open for credit to students with credit in EE 420. (Lecture-problems 3 hours) Letter grade only (A-F).
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1.00 Credits
Corequisite: EE 435. Laboratory evaluation of IC process steps. Wafer probe, packaging, and final test. Empirical device model formulation from test data. Not open for credit to students with credit in EE 420L. (Laboratory 3 hours) Letter grade only (A-F).
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3.00 Credits
Prerequisites: EE 330 and PHYS 254; or MAE 300. Techniques and the technology of miniaturization of electrical, mechanical, optical, and opto-electronic devices in sizes from millimeters to nanometers. Design examples of sensors, microlenses, cantilevers, and micromotors, process fabrication. Additional projects required for EE 536. (Lecture-problems 3 hours) Letter grade only (A-F).
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3.00 Credits
Prerequisite: Consent of instructor. Introduces four key areas: nanoscience properties of materials; nanotechnology in biology and nature; observation, measurement, analysis; applications. Importance of understanding and engineering nanoscale structures, materials, and processes for the 21st Century. Use of scanning electron microscope and atomic force microscope. (Lecture-problems 2 hours, laboratory 3 hours) Letter grade only (A-F).
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3.00 Credits
Prerequisite: EE 482 or consent of instructor. Computer communication network hardware and software. Protocols, networks, relational database technology. Examples of client/server and peer-to-peer computing applications. Tools and development environments. Groupware, middleware. A class project and class presentation will be required in addition to laboratory projects. (Lecture-problems 2 hours, laboratory 3 hours) Letter grade only (A-F).
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3.00 Credits
Prerequisite: EE 347 or consent of the instructor. Advanced microprocessors such as Pentium series, RISC, and CISC. Hardware features and new instructions. Support for virtual memory, paging, privilege levels, multitasking and internal cache. Floating point coprocessors. Embedded controllers, on-chip resources and applications. (Lecture-problems 2 hours, laboratory 3 hours) Letter grade only (A-F).
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3.00 Credits
Prerequisites: EE 301 or 435, 346, 400D, 430. Extensive laboratory projects. Design of analog and digital systems. Computer-aided design including, for example, hardware descriptive language (HDL) and SPICE. (Lecture-problems 2 hours. laboratory 3 hours) Letter grade only (A-F).
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3.00 Credits
Prerequisites: EE 445 or equivalent and EE 482 or equivalent. Wireless and Mobile Ad-hoc Networks and Security. Ad-hoc and geographic routing, resource discovery, MAC, IP-mobility, mobility modelling, wired-wireless networks, security aspects. Lab Projects will include use of tools such as OPNET, Ethereal, Sniffer, Scanner, IDS, etc. Advanced project required for EE 548. (Lecture-problems 3 hours) Letter grade only (A-F).
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