ChE 115 - Electronic Materials Processing

Institution:

California Institute of Technology

Subject:

Chemical Engineering

Description:

After a brief introduction to solid-state concepts, materials, and devices relevant to electronic applications, the course will cover the prevalent growth and etching techniques used in processing of electronic materials. Emphasis is on the underlying physical and chemical principles. Crystal and thin film growth techniques to be covered include physical and chemical vapor deposition, liquid-phase epitaxy, molecular beam epitaxy, and plasma-assisted deposition. Property altering processes such as diffusion, oxidation, and doping are also included. Plasma etching is introduced with emphasis on determining key parameters that control the ion energy and flux to the wafer surface. Key techniques for thin film analysis and characterization are briefly discussed. Instructor: Giapis. Given in alternate years; offered 2012–13.

Credits:

9.00

Credit Hours:

Prerequisites:

ChE 63 ab, ChE 103 abc, ChE 101, or instructor’s permission.

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.caltech.edu

Phone Number:

(626) 395-6811

Regional Accreditation:

Western Association of Schools and Colleges

Calendar System:

Quarter

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