NMT 214 - Lithography for Nanofabrication

Institution:

Luzerne County Community College

Subject:

Nanofabrication Manufacturing Tech - Science Track

Description:

This course will cover all aspects of lithography from design and mask fabrication to pattern transfer and inspection. The course is divided into three major sections. The first section describes the lithographic process from substrate preparation to exposure. Most of the emphasis will be on understanding the nature and behavior of photoresist materials. The second section examines the process from development through inspection (both before and after pattern transfer). This section will introduce optical masks, aligners, steppers and scanners. In addition, CD control and profile control of photoresists will be investigated. The last section will discuss advanced lithographic techniques such as e-beam, X-ray, EUV, and ion beam lithography.

Credits:

3.00

Credit Hours:

Prerequisites:

CHE 151, GET 251 or GET 252

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture/Lab

Notes:

Additional Information:

Historical Version(s):

09/01/2006 - 01/03/2013 

Institution Website:

www.luzerne.edu

Phone Number:

(570) 740-0200

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

The Course Profile information is provided and updated by third parties including the respective institutions. While the institutions are able to update their information at any time, the information is not independently validated, and no party associated with this website can accept responsibility for its accuracy.