2 391J - Nanostructure Fabrication

Institution:

Massachusetts Institute of Technology

Subject:

Description:

Describes current techniques used in analyzing and fabricating nanometer-length-scale structures and devices. Covers fundamentals of optical, electron (scanning, transmission, and tunneling), and atomic-force microscopy; optical, electron, ion, and nanoimprint lithography, templated self-assembly, and resist technology. Surveys substrate characterization and preparation, facilities, and metrology requirements for nanolithography. Nanodevice processing methods such as liquid and plasma etching, lift-off, electroplating, and ion-implant are also presented. Some applications in nanoelectronics, nanomaterials, and nanophotonics are discussed.

Credits:

4.00

Credit Hours:

Prerequisites:

Prereq: 6.152, 6.161, or 2.710; or permission of instructor

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

web.mit.edu/student/

Phone Number:

(617) 253-1000

Regional Accreditation:

New England Association of Schools and Colleges

Calendar System:

Four-one-four plan

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