ECE 510 - Micro and Nanolithography

Institution:

University of Illinois at Urbana-Champaign

Subject:

Description:

A comprehensive foundation in the broad field of micro and nanolithography, including the science of optical imaging, photochemistry, and materials issues; technological developments including state-of-the-art commercial lithography systems; applications of micro and nanolithography to diverse fields, including semiconductor devices, displays, flexible electronics, microelectromechanical systems, and biotechnology. Prerequisite: One of ECE 444, ECE 460, MSE 462, NPRE 429, PHYS 402.

Credits:

4.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.illinois.edu/

Phone Number:

(217) 333-1000

Regional Accreditation:

North Central Association of Colleges and Schools

Calendar System:

Semester

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