EE 403 - Introduction to Plasma Processing

Institution:

University at Buffalo

Subject:

Description:

Credits: 3 Prerequisites: MTH 4or MTH 306; PHY 108 Corequisites: None Type: LEC Introduces plasma processing including plasma deposition, plasma etching, gaseous electronics, gas lasers and plasma materials processing. Topics include basic atomic theory, elementary kinetic theory of gases, motion of charges in electric and magnetic fields, plasma properties, plasma generation and devices, plasma-surface interactions, electrodes and discharge characteristics, plasma diagnostics and plasma simulation. Students prepare web-based presentations in current plasma technologies with focus on applications in electrical engineering field.

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.buffalo.edu

Phone Number:

(716) 645-2000

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

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