EE 448 - Microelectronic Device Fabrication

Institution:

University at Buffalo

Subject:

Description:

Credits: 3 Prerequisites: EE 311 Corequisites: None Type: LEC Fabrication technology for microelectronic devices: crystal growth, wafer fabrication and characterization, mask fabrication, epitaxy, lithography, etching, diffusion, CVD, ion implantation, dc and RF plasma reactors (operating principles and fabrication applications), packing. Operation of microelectronic devices (interconnects, passive devices, and MOS and BJT devices), micro-optical devices (CDRs, etc.) and micro electro-mechanical devices (micro-motors, micro-mirror arrays, etc). Students select a part of the fabrication process (lithography, diffusion, etc.) and use simulation code to design that step of the process to achieve specific device properties.

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.buffalo.edu

Phone Number:

(716) 645-2000

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

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