AMM 410/410A - Apparel Product Development

Institution:

California State Polytechnic University-Pomona

Subject:

Description:

Beginning of capstone experience for senior production students. Development of patterns, prototypes, and samples. Use of CAD technology in development of pattern blocks and first patterns. Application of pattern theory for fit and pattern verification. Application of apparel industry pattern marking and assembly. Evaluation of standard and custom fit. Concurrent enrollment required. 2 hours lecture/problem solving. 2 twohour activities. Prerequisites: AMM 300, AMM 314/314A, AMM360, and AMM 381.

Credits:

1.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.csupomona.edu

Phone Number:

(909) 869-7659

Regional Accreditation:

Western Association of Schools and Colleges

Calendar System:

Quarter

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