ENG ME 568 - Modeling of Pattern Transfer in MicrolithographyPrereq

Institution:

Boston University

Subject:

Description:

ENG ME 400; consent of instructor. This course covers simulation methods essential for improving the manufacturability of semiconductor microchips. In particular, the simulation of microlithography processes is covered, as microlithography is the key component of semiconductor manufacturability. The following aspects are covered: optical simulation, photoresist simulation, etching, electron beam mask making simulation, and phenomenological models. Emphasis is placed on incorporating this information into current manufacturing R&D directions and on applying these simulation methods to help address key technology problems areas. 4 cr.

Credits:

4.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.bu.edu

Phone Number:

(617) 353-2000

Regional Accreditation:

New England Association of Schools and Colleges

Calendar System:

Semester

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