0305-564 - Microlithography Systems

Institution:

Rochester Institute of Technology

Subject:

Description:

A course covering the physical aspects of lithography. Image formation in optical projection, optical proximity, and high energy systems (DUV/VUV, e-beam/SCALPEL, x-ray, and EUV) are studied. Fresnel diffraction, Fraunhofer diffraction, and Fourier optics are utilized to understand diffraction-limited imaging processes. Topics include illumination, lens parameters, image assessment (resolution, alignment and overlay), phase-shift masking, and resist interactions. Lithographic systems are designed and optimized through use of modeling and simulation packages. Current status of the practical implementation of advanced technologies in industry as well as future requirements will be presented. (0305-221, 320, 350) Class 3, Lab 0, Credit 3 (S, SU)

Credits:

0.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Multiple

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.rit.edu/

Phone Number:

(585) 475-2411

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Quarter

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