IC 0305-350 - Technology

Institution:

Rochester Institute of Technology

Subject:

Description:

An introduction to the basics of integrated circuit fabrication. The electronic properties of semiconductor materials and basic device structures are discussed, along with fabrication topics including photolithography diffusion and oxidation, ion implantation, and metallization. The laboratory uses a four-level metal gate PMOS process to fabricate an IC chip and provide experience in device design - and layout (CAD), process design, in-process characterization and device testing. Students will understand the basic interaction between process design, device design and device layout. (0305-201) Class 3, Lab 3, Credit 4 (F, S)

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.rit.edu/

Phone Number:

(585) 475-2411

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Quarter

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