0305-666 - Microlithography Materials and Processes

Institution:

Rochester Institute of Technology

Subject:

Description:

Covers the chemical aspect of microlithography and resist processes. The chemistry of positive (novolac-based) and chemically amplifi ed resist systems will be studied. Topics include the principles of photo polymerization, including synthesis, photo absorption and emission, processing technologies and methods of process optimization. Also, advanced lithographic techniques and materials, including multi-player techniques for BARC, TARC, and silylation are applied to optical lithography. (0305-221, 320, 350) Class 3, Lab 0, Credit 3 (F, W)

Credits:

0.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Multiple

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.rit.edu/

Phone Number:

(585) 475-2411

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Quarter

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