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Institution:
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Virginia Polytechnic Institute and State University
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Subject:
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Description:
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Manufacturing practices used in silicon integrated circuit fabrication and the underlying scientific basis for these process technologies. Physical models are developed to explain basic fabrication steps, such as substrate growth, thermal oxidation, dopant diffusion, ion implantation, thin film deposition, etching, and lithography. The overall CMOS integrated circuit process flow is described within the context of these physical models. Pre: 2204 or 3054. (3H,3 Credits). I.
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Credits:
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3.00
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Credit Hours:
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Prerequisites:
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Corequisites:
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Exclusions:
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Level:
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Instructional Type:
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Lecture
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Notes:
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Additional Information:
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Historical Version(s):
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Institution Website:
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Phone Number:
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(540) 231-6000
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Regional Accreditation:
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Southern Association of Colleges and Schools
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Calendar System:
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Semester
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