ECE 441 - Advanced Silicon Technology

Institution:

Boise State University

Subject:

Description:

Advanced models for unit processes such as diffusion, oxidation, ion implantation, thin film deposition, etching, rapid thermal processing, chemical mechanical polishing, and lithography. CMOS, bipolar, and microelectromechanical systems (MEMS) process integration. Process and device modeling using TCAD. PREREQ: ECE 440.

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.boisestate.edu

Phone Number:

(208) 426-1011

Regional Accreditation:

Northwest Commission on Colleges and Universities

Calendar System:

Semester

The Course Profile information is provided and updated by third parties including the respective institutions. While the institutions are able to update their information at any time, the information is not independently validated, and no party associated with this website can accept responsibility for its accuracy.