ECE 442 - Photolithography

Institution:

Boise State University

Subject:

Description:

Principles of optics, diffraction, interference, superposition of waves, imaging systems, fundamentals of microlithography, resolution, contact and projection lithography, photoresist processing, metrology. Phase shift masks, anti-reflective coatings, deep-ultraviolet lithography, off-axis annular illumination. Use of TCAD lithography simulation software. COREQ: ECE 340.

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.boisestate.edu

Phone Number:

(208) 426-1011

Regional Accreditation:

Northwest Commission on Colleges and Universities

Calendar System:

Semester

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