APTX 225 - pattern Design-CAD

Institution:

Metropolitan Community College-Penn Valley

Subject:

Description:

3 credits. 5 hours. (Lecture 1 hour. Laboratory 4 hours.) Prerequisites: APTX 211 and APTX 215. Basic principles and methods of pattern design through computer aided design methods. Development of basic slopers in full scale sizes. Exploration of pattern design techniques and process through use of industry level computer software applications.

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Multiple

Notes:

Additional Information:

Historical Version(s):

Institution Website:

Phone Number:

Regional Accreditation:

North Central Association of Colleges and Schools

Calendar System:

Unaccounted for code

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