APTX 211 - pattern Design-Flat

Institution:

Metropolitan Community College - Missouri

Subject:

Description:

3 credits. 5 hours. (Lecture 1 hour. Laboratory 4 hours.) Prerequisite: APTX 113. Basic principles and methods of flat pattern drafting. Development of skirt, bodice, pant and dress slopers; in full scale sizes. Cut, sew and fit muslin prototypes. Original design development from basic sloper. Pattern making process and design room techniques.

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Multiple

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.mcckc.edu

Phone Number:

Regional Accreditation:

North Central Association of Colleges and Schools

Calendar System:

Unaccounted for code

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