APTX 215 - pattern Design-Draping

Institution:

Metropolitan Community College - Missouri

Subject:

Description:

3 credits. 5 hours. (Lecture 1 hour. Laboratory 4 hours.) Prerequisites: APTX 113, APTX 211, or concurrent enrollment. Basic principles and methods of pattern design through draping. Development of basic slopers in full scale sizes. Exploration of draping techniques and process of developing a draping plan to execute original designs.

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Multiple

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.mcckc.edu

Phone Number:

Regional Accreditation:

North Central Association of Colleges and Schools

Calendar System:

Unaccounted for code

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