ADS 111 - Design Through Flat Patternmaking I

Institution:

Seattle Community College-Central Campus

Subject:

Description:

Introduction to the development of production patterns using flat pattern and drafting methods. Focus is on fundamental patternmaking practices and developing basic patterns to be modified using a variety of pattern manipulations.

Credits:

4.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.seattlecentral.edu

Phone Number:

(206) 934-3800

Regional Accreditation:

Northwest Commission on Colleges and Universities

Calendar System:

Quarter

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