AP 223 - Advanced Computer-Aided Flat Pattern Design

Institution:

Fashion Institute of Technology

Subject:

Description:

Prerequisite: AP 222 or approval of chairperson Learn advanced features and capabilities of computer-aided design using the Lectra Modaris pattern design software. Using the CAD system, recreate the pattern designer's traditional working environment by translating original ideas to the computer, digitizing and modifying designs, plotting out design creations, and managing the file information.

Credits:

2.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Multiple

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.fitnyc.edu

Phone Number:

(212) 217-7999

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

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