TEL 263 - Lithography for Nanofabrication

Institution:

Delaware County Community College

Subject:

Electronics Technology

Description:

This course covers all aspects of advanced lithography from design and mask fabrication to pattern transfer and inspection. The course is divided into three major sections. The first section describes the advanced lithographic process from substrate preparation to exposure. Most of the emphasis is on understanding the nature and behavior of photoresist materials. The second section examines systems and techniques that define patterns. This section will introduce specialized optical masks and reticles, aligners, steppers and scanners. In addition, critical dimension (CD) control and profile control of photoresist will be investigated. The last section will discuss advanced optical lithographic techniques such as phase shifting masks and illumination schemes as well as e-beam, e-ray, EUV, and ion beam lithography. A section about engineering dielectrics is also discussed. Upon successful completion of this course, students should be able to: Explain the process steps necessary to produce a photolithographic pattern in positive, negative and chemically amplified resists; Describe the nature and behavior of photoactive materials such as BCB; Describe all lithographic techniques in nanofabrication; Explain mask layout and fabrication for photolithography; Describe and perform alignment and registration in photolithography; Identify the equipment used in photolithography; Set up and operate equipment used in photolithography; Modify profiles in photoresist for liftoff applications.

Credits:

3.00

Credit Hours:

Prerequisites:

TEL 260 and TEL 261

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.dccc.edu

Phone Number:

(610) 359-5000

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

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