NSC 214 - Patterning for Nanotechnology

Institution:

Reading Area Community College

Subject:

Nanoscience

Description:

This course is a hands-on treatment of all aspects of advanced pattern transfer and pattern transfer equipment including probe techniques; stamping and embossing; e-beam; and optical contact and stepper systems. The course is divided into five major sections. The first section is an overview of all pattern generation processes covering aspects from substrate preparation to tool operation. The second section concentrates on photolithography and examines such topics as mask template, and mold generation. Chemical makeup of resists will be discussed including polymers, solvents, sensitizers, and additives. The role of dyes and antireflective coatings will be discussed. In addition, critical dimension (CD) control and profile control of resists will be investigated. The third section will discuss the particle beam lithographic techniques such as e- beam lithography. The fourth section covers probe pattern generation and the fifth section explores imprinting lithography, step-and-flash, stamp lithography, and self- assembled lithography.

Credits:

3.00

Credit Hours:

Prerequisites:

NSC 212 and NSC 213

Corequisites:

NSC 212, NSC 213

Exclusions:

Level:

Instructional Type:

Lecture/Lab

Notes:

A Grade of D or Higher is Required for all Listed Prerequisite Courses.

Additional Information:

Historical Version(s):

Institution Website:

www.racc.edu

Phone Number:

(610) 372-4721

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

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